HORIBA / JOBIN YVON UVISEL II is an advanced spectroscopic ellipsometer used for characterizing thin film materials in a non-destructive and precise manner. This instrument is designed to measure the spectral reflectance and transmittance of samples over a wide range of wavelengths (from ultraviolet to near-infrared) by analyzing the changes in polarization state of light upon reflection or transmission through the sample. HORIBA UVISEL II ellipsometer utilizes a rotating compensator and a photoelastic modulator to control the polarization of incident light, enabling accurate measurements of the complex optical properties of thin films, such as refractive index and thickness. The instrument is equipped with a high-performance spectrometer and a sensitive photodetector array to capture the polarized light signals, providing detailed information about the optical response of the sample. One of the key features of JOBIN YVON UVISEL II ellipsometer is its versatility in measuring a wide range of sample types, including semiconductors, optical coatings, polymers, and biofilms. The instrument can be configured with various light sources, such as laser diodes, xenon lamps, and halogen bulbs, to tailor the measurements to the specific optical properties of the sample under investigation. UVISEL II ellipsometer offers multiple measurement modes, including variable angle spectroscopic ellipsometry, Mueller matrix ellipsometry, and depolarization imaging, allowing researchers to analyze the anisotropic properties of samples and characterize complex multilayer structures. The instrument is controlled by user-friendly software that enables easy setup and data analysis, facilitating quick and accurate measurement of thin film properties. In addition to thin film characterization, HORIBA / JOBIN YVON UVISEL II ellipsometer can also perform in-situ measurements during thin film deposition processes, enabling real-time monitoring of film growth and optical properties. This capability is particularly useful for optimizing thin film fabrication processes and ensuring the quality and reproducibility of thin film materials. HORIBA UVISEL II ellipsometer is widely used in research and development laboratories, semiconductor manufacturing facilities, and academic institutions for a variety of applications, including optical coatings design, surface engineering, and thin film device fabrication. Its high sensitivity, accuracy, and repeatability make it an indispensable tool for studying the optical properties of a wide range of materials with nanometer-scale resolution. In conclusion, JOBIN YVON UVISEL II ellipsometer is a state-of-the-art instrument for precise and comprehensive characterization of thin film materials, providing researchers with valuable insights into the optical behavior of materials and enabling the development of advanced optical devices and coatings. Its advanced features, ease of use, and versatility make it a valuable tool for a wide range of applications in materials science, nanotechnology, and photonics research. Requires Freight shipping